Thin Films Books

The Materials Science of Thin Films

Milton Ohring

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Customer Reviews:
Total reviews: 2 Average rating: 4.0 of 5

good 5 out of 5 stars.
7 of 7 people found this review helpful.

This is a very good book for coating engineers. The richness of the explanation of a variety of subjects is worthy of reading it carefully, from beginning to the end.

And in addition, I find the process of reading the book is quite a happy thing of enjoying the beauty of English, though I am not a native speaker.(I'd like to look forward to reading similar comments so as to confirming this impression of mine)

The book is precise and in depth.

Editorial Review:

This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field.

Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Thin-Film Deposition: Principles and Practice

Donald Smith

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Customer Reviews:
Total reviews: 1 Average rating: 5.0 of 5

Good book for a beginner in thin film deposition 5 out of 5 stars.
4 of 4 people found this review helpful.

I recommend this book to anyone who is interested in process technologies that are used in chipmaking. The chapters are organized well and points are explained in a clear concise way. I am a chemistry major and this book helped me get started in my first job in a chipmaking company.

Editorial Review:

Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.

Solid Surfaces, Interfaces and Thin Films

Hans Lüth

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Customer Reviews:
Total reviews: 2 Average rating: 5.0 of 5

Great Book for a Beginer.. 5 out of 5 stars.
3 of 3 people found this review helpful.

Most of the people studying surface-interface properties, soon begin to concentrate on their topic of interest and forget the proverb "see around". This book provides a nice journey into the basics of surface study. Weather u are a experimentalist looking into the details of electron diffraction or a theoretist interested in electronic structure, this book is for you. To quote author, "need no changes in the structure of the book", even after many years of previous edition. I too did not find any specific lacuana in the book, which well justifies its space in the ravks of all surface scientists.

Editorial Review:

This book emphasizes both experimental and theoretical aspects of surface, interface and thin film physics. Compared to the earlier editions, which bore the title "Surfaces and Interfaces of Solid Materials", the book now places more emphasis on thin films, including also their superconducting and ferromagnetic properties. The present 4th edition thus presents techniques of preparing well-defined solid surfaces and interfaces, fundamental aspects of adsorption and layer growth, as well as basic models for the description of structural, vibronic and electronic properties of surfaces, interfaces and thin films. Because of their importance for modern information technology, significant attention is paid to the electronic properties of semiconductor inter- faces and heterostructures. Collective phenomena, such as superconductivity and ferromagnetism, also feature prominently. Experimental sections covering essential measurement and preparation techniques are presented in separate panels.

Thin Film Optical Filters, Third Edition

H. Angus Macleod

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Customer Reviews:
Total reviews: 2 Average rating: 4.0 of 5

A solid study of light! 4 out of 5 stars.
2 of 3 people found this review helpful.

This book has got it all--practical, insightful, and well-organized. Sadly, it has got just slightly too much of it all, I found it long-winded at times. That being said, still an very good book if you are interested in such effervescent matters as light and how man attempts to control it.

Editorial Review:

This is a comprehensive introduction to thin-film

optical filters written for professionals in industry

and those entering the field. It also provides a

solid foundation for students on appropriate

graduate courses.

It provides a unified treatment of the design,

manufacture, performance and application of

optical thin films. It includes the mathematics

necessary for the reader / user to carry out

thin-film calculations. Contains extensive

reference to the original literature. The coverage

of optical filters includes antireflection and

high-reflectance coatings.

Readership

Written for all users of optical coatings as an

introduction and reference. For people working in

industry, particularly optical system and

component manufacturers; researchers in

physics, and engineering departments

investigating the growth, properties and

applications of thin films.

PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing (Thin Films)

Ronald A. Powell, Stephen Rossnagel

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Editorial Review:

GENERAL DESCRIPTION OF THE SERIES
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

GENERAL DESCRIPTION OF THE VOLUME
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Preparation of Thin Films

George

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Editorial Review:

"Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "

Practical Design and Production of Optical Thin Films (Optical Engineering, 79)

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Customer Reviews:
Total reviews: 1 Average rating: 5.0 of 5

One indispensable volume for a thin film maker 5 out of 5 stars.
3 of 5 people found this review helpful.

Almost all knowledges about the manufacturing of an optical thin film are coverd.Especially bibliograpy is substantial.Although most required things have gathered, they are good.About the theoretical portion of the characteristic of a thin film, explanation is by for beginners a little.Although there is nothing, since there are some which explained it mostly, they do not become a problem.
As the 2nd book,it is indispensable to those who are going to study the optical thin film.
In a thin film maker's bookshelf,It is one volume which should be equipped with and placed.

Editorial Review:

Contains expanded discussions on design visualization, dense wavelength division multiplexing, new coating, equipment, electrochromatic and chemically active coatings, ion-assisted deposition, and optical monitoring sensitivity.

Thin Films: Interfaces and Phenomena : Symposium (Materials Research Society Symposium Proceedings)

Robert J. Nemanich, P. S. Ho

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In Situ Real-Time Characterization of Thin Films

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Editorial Review:

An in-depth look at the state of the art of in situ

real-time monitoring and analysis of thin films

With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include:
* Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes
* Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces
* Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials
* Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes
* X-ray fluorescence spectroscopy for studying surface and interface structures
* And other cost-effective techniques for industrial application

Contemporary Preparative Techniques (Physics of Thin Films Volume 14) (v. 14)

Maurice H. Francombe, John L. Vossen

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